JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA

SCI/SCIE
  • 期刊ISSN:0368-2048
  • 研究方向:物理
  • 影响因子:1.343
  • SCI类别:SCI/SCIE
  • 是否OA:No
  • 出版地:NETHERLANDS
  • 年文章数:84
  • 涉及的研究方向:物理-光谱学
http://ees.elsevier.com/elspec/default.asp?acw=&utt=0
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA简介 Magazine introduction
  • 英文简介

    The Journal of Electron Spectroscopy and Related Phenomena publishes experimental, theoretical and applied work in the field of electron spectroscopy and electronic structure, involving techniques which use high energy photons (>10 eV) or electrons as probes or detected particles in the investigation.The journal encourages contributions in the general area of atomic, molecular, ionic, liquid and solid state spectroscopy carried out using electron impact, synchrotron radiation (including free electron lasers) and short wavelength lasers. Papers using photoemission and other techniques, in which synchrotron radiation, Free Electron Lasers, laboratory lasers or other sources of ionizing radiation, combined with electron velocity analysis are especially welcome. The materials properties addressed include characterization of ground and excited state properties as well as time resolved electron dynamics.The individual techniques of electron spectroscopy include photoelectron spectroscopy of both outer and inner shells; inverse photoemission; spin-polarised photoemission; time resolved 2-photon photoemission, resonant and non-resonant Auger spectroscopy including ion neutralization studies; edge techniques (EXAFS, NEXAFS,...) , resonant and non-resonant inelastic X-ray scattering (RIXS), spectro-microscopy, high resolution electron energy loss spectroscopy; electron scattering and resonance electron capture; electron spectroscopy in conjunction with microscopy; penning ionization spectroscopy including scanning tunneling spectroscopy; theoretical treatments of the photoemission, X-ray emission, Auger, energy loss and Penning ionization processes. Contributions on instrumentation and technique development, date acquisition - analysis - quantification are also welcome.Subject areas covered include spectroscopic characterization of materials and processes concerning:- surfaces, interfaces, and thin films;- atomic and molecular physics, clusters;- semiconductor physics and chemistry;- materials for photovoltaics;- materials science including: metal surfaces, nanoparticles, ceramics, strongly correlated systems, polymers, biomaterials and other organic films;- catalysis

  • 中文简介

    《电子光谱学及相关现象杂志》发表了在电子光谱学和电子结构领域的实验、理论和应用工作,涉及在研究中使用高能光子(>10eV)或电子作为探针或检测粒子的技术。该杂志鼓励在原子、分子、离子、液体和固体光谱的一般领域做出贡献,这些领域使用电子冲击、同步辐射(包括自由电子激光器)和短波长激光器。论文采用光发射和其他技术,其中同步辐射,自由电子激光器,实验室激光器或其他电离辐射源,结合电子速度分析特别受欢迎。所讨论的材料特性包括基态和激发态特性以及时间分辨电子动力学。电子光谱学的独立技术包括外层和内层的光电子光谱学;逆光电发射;spin-polarised光电发射;时间分辨双光子光发射、共振和非共振俄歇光谱包括离子中和研究;边缘技术(EXAFS, NEXAFS,…),共振和非共振非弹性x射线散射(RIXS),光谱显微镜,高分辨率电子能量损失光谱;电子散射和共振电子俘获;电子光谱学与显微技术的结合;潘宁电离光谱包括扫描隧穿光谱;光发射、x射线发射、螺旋钻、能量损失和彭宁电离过程的理论处理。也欢迎在仪器仪表和技术发展、数据采集-分析-量化方面作出贡献。涉及的主题领域包括材料和工艺的光谱特性,涉及:-表面、界面和薄膜;-原子和分子物理学,团簇;-半导体物理化学;-光伏材料;-材料科学包括:金属表面、纳米颗粒、陶瓷、强相关系统、聚合物、生物材料和其他有机薄膜;-催化。

  • 影响因子趋势图

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